Oxford Instruments Plasma Technology and the Cornell NanoScale Facility (CNF) will hold a technical seminar addressing the latest research and technologies in plasma etch deposition and growth. This one-and-a-half day event is being held on Tuesday and Wednesday, the 20th and 21st of August, at Cornell University, in Ithaca, NY, and will include presentations, discussions, a poster session focusing on latest innovations, and a networking lunch.
Speakers are from key international research institutes, who will discuss their research:
Prof. Peter Ashburn, Southampton University, UK
Vincent Genova, Cornell NanoScale Facility, Cornell University
Prof. Axel Scherer, Director, Caltech, CA
In addition, experts in their field from Oxford Instruments and Cornell University will speak on the latest process and applications developments in a number of plasma processing areas.
Speakers are from key international research institutes, who will discuss their research:
Prof. Peter Ashburn, Southampton University, UK
Vincent Genova, Cornell NanoScale Facility, Cornell University
Prof. Axel Scherer, Director, Caltech, CA
In addition, experts in their field from Oxford Instruments and Cornell University will speak on the latest process and applications developments in a number of plasma processing areas.
- Workshop
- Micro and Nanotechnologies
