This workshop covers a variety of material related to the thin films used in microtechnology. Topics include oxidation of silicon dioxide, wet vs. dry oxidation, silicon dioxide etch, interpreting silicon dioxide thicknesses, and light interference of thin films. Activities include comparing and contracting wet and dry oxidation processes, visually estimating various silicon dioxide thicknesses on silicon wafers, calculating etch rates, creating graphs using collected data, and determining the various relationship between silicon dioxide thicknesses, time, and etch rates. This workshop introduces the Rainbow Kit that can be used in the classroom to support all of these activities.

Class size is limited.