This event is being organized with our hosts UCSB, and will cover several aspects Atomic Layer Deposition (ALD) and Ion Beam etch and deposition processes and technologies.

Guest speakers from renowned research & manufacturing organizations, speakers from UCSB, and technical experts from Oxford Instruments will all speak on topics from the fundamentals of these technologies, through to User experiences, and hints and tips from Oxford Instruments. The program will also allow plenty of time for discussion and questions. In addition there will be a technical poster session by Oxford Instruments.

This will be an excellent opportunity for networking between researchers, users and our guest speakers from academia and industry.

• Program will include:
• An introduction to plasma and thermal ALD techniques
• ALD Hardware developments
• An introduction to Ion Beam technology
• Ion Beam Etch – a users perspective
• Ion Beam developments
• ALD Process (Metal & Nitride ALD)
• ALD – a user’s results
• Ask the experts, Q & A & ion beam & ALD process posters