ATE Central

Sputtering is a fundamental Physical Vapor Deposition method that utilizes plasma. This session will focus on igniting a plasma for the benefit of thin film deposition. Both DC and RF plasma-based sputtering methods will be discussed. The physics of plasma will be elucidated by emphasizing the importance of different power supply and pressure settings using simulations. Ion bombardment and sputtering of atoms from the target materials will be interactively analyzed with the aid of simulations, as well. The resulting superiority of sputtering over evaporation will be discussed. Finally, a nucleation example will be covered by sputtering gold on a glass sample. The optical properties of the sputtered material will be studied in order to understand how gold atoms are sputter-coated on a substrate such as glass.

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