Microsystems use several types of thin films (e.g., oxides, nitrides, metals) to fabricate micro-sized devices. Some films, such as nitrides, are used as structural layers while others, such as metals, are used as conductors. Thin films are deposited or grown on a surface using numerous deposition techniques. Each film has its own characteristics and properties. This topic explores some of these characteristics and properties as well as the processes used to deposit these films.
SCME's "Science of Thin Films Kit" uses a rainbow wafer to introduce the characteristics of silicon dioxide (oxide) and to provide an actual oxide wafer from which you can extract data to determine oxide thickness and etch rates. You can also use this wafer to study light interference with different layers of oxide. A rainbow wafer is an oxide layered silicon wafer that has been etched using a manual process, resulting in several different thicknesses of oxide. In the picture, each color is a different thickness of silicon dioxide.
The activities in Science of Thin Films include interpreting logarithmic graphs, calculating etch rates, and estimating the line of best fit for an etch rate curve. You are also asked to estimate the oxide thicknesses of the rainbow wafer by the color seen when light goes through the transparent thin film at a specific angle.
The concepts introduced and explored in this topic can be applied to chemistry, physics, mathematics, engineering, and micro and nanotechnologies.
