E SC 212: Basic Nanotechnology Processes Laboratory

This web page, from the Nanotechnology Applications and Career Knowledge Support Center (NACK Center), includes template and turnkey laboratories that are part of the E SC 212: Basic Nanotechnology Processes course. The following labs are included:

• Introduction to Plasma-Based Processing
• Reactive Ion Etching (REI)
• Introduction to Top-down Lithography: Contact & Proximity Lithography
• Introduction to LPCVD & PECVD
• Introduction to PVD: Thermal Evaporation of a Microarray
• PVD: Evaporator Practice
• Liftoff and Surface Modification
• REI Online
• Intro to Litho Online
• Liftoff Online Lab Final
• Intro to LPCVD
• PVD Uniformity Analysis

Each lab includes a variety of information, such as an objective, background information, a detailed procedure, charts and tables, and follow-up questions. Labs are available to download in either .doc or .pdf formats. A link is also provided for other related labs. Course lectures are available to view separately. Users must set up a free account to download the materials.