ATE Central

Photolithography Overview for MEMS Learning Module

Module Description: 

This learning module, from Support Center for Microsystems Education (SCME), "provides an overview of the most common photolithography process used in the fabrication of microelectromechanical systems (MEMS), photolithography terminology and basic concepts." These concepts are explored in the provided module activities. 

Module Contents:

This module includes six instructor guides, five participant guides, and a PowerPoint presentation. PDF and DOC versions are provided for all of the guides. The included guides are Knowledge Probe, Primary Knowledge (PK), Final Assessment, Photoresist Thickness Activity, and Activity - Terminology. Instructor guides include additional content such as notes and questions and answers. A Learning Module Map Instructor Guide is also included. 

The Learning Module Map provides information about the module including module contents, target audience, and a map that is divided into the following three sections: Important Steps, Key Points, and Reasons. 

The Knowledge Probe includes 16 questions for assessing the participant's knowledge of photolithography processes before completing the module. 

The Primary Knowledge (PK) guide is an introductory unit and provides a "general overview of the photolithography process use[d] in the fabrication of microsystems as well as integrated circuits." The following sections are included: Introduction, Pattern Transfer, Learning Module Objectives, Steps of Photolithography, Photolithography vs. Photography, Coat Process: Step 1 - Surface Conditioning, and more. 

The Terminology activity "provides the participants an opportunity to better understand the terminology associated with Photolithography processing." This activity includes a crossword puzzle and post-activity questions.

The Photoresist Thickness activity "provides the participants an opportunity to further explore the coat process and the relationships between photoresist thickness, spin speed, and viscosity."

The Final Assessment includes 18 questions that assess the participants' knowledge of the photolithography process after the completion of the learning module.  

A Photolithography Overview PowerPoint presentation is also included. This presentation covers the following topics: photolithography and MEMS, the photolithography process, photolithography vs. photography, photolithography steps, pattern transfer, three steps of photolithography, and more. 

For orientation purposes the 'Fab_PrLith_LM_Map' PDF is included as a separate attachment and offers a sample of the type of material included in this module.

Below is a list of the files included in the .zip attachment. The size of each file is included in parenthesis. 

Photolithography Overview for Microsystems (32 files, 18.7 MB)

  • Instructor Guides
    • PDFs
      • Activity - Terminology Instructor Guide (Fab_PrLith_AC00_IG.pdf 222 KB)
      • Photoresist  Thickness Activity Instructor Guide (Fab_PrLith_AC10_IG.pdf 418 KB)
      • Final Assessment Instructor Guide (Fab_PrLith_FA00mc_IG.pdf 373 KB)
      • Knowledge Probe Instructor Guide (Fab_PrLith_KP00_IG.pdf 169 KB)
      • Learning Module Map (Fab_PrLith_LM_Map.pdf 116 KB)
      • Primary Knowledge (PK) Instructor Guide (Fab_PrLith_PK00_IG.pdf 1.2 MB)
    • Word Docs
      • Activity - Terminology Instructor Guide (Fab_PrLith_AC00_IG_March2017.docx153  KB)
      • Photoresist  Thickness Activity Instructor Guide (Fab_PrLith_AC10_IG_March2017.docx 304 KB)
      • Final Assessment Instructor Guide (Fab_PrLith_FA00_IG_March2017.docx 250 KB)
      • Knowledge Probe Instructor Guide (Fab_PrLith_KP00_IG_March2017.docx 184 KB)
      • Learning Module Map (Fab_PrLith_LM_MAP_IG_March2017.docx 125 KB)
      • Primary Knowledge (PK) Instructor Guide (Fab_PrLith_PK00_IG_March2017.docx 1.7 MB)
  • Participants Guides
    • PDFs
      • Activity - Terminology Participant Guide (Fab_PrLith_AC00_PG.pdf 168 KB)
      • Photoresist Thickness Activity Participant Guide (Fab_PrLith_AC10_PG.pdf 368 KB)
      • Final Assessment Participant Guide (Fab_PrLith_FA00mc_PG.pdf 358 KB)
      • Knowledge Probe Participant Guide (Fab_PrLith_KP00_PG.pdf 160 KB)
      • Primary Knowledge (PK) Participant Guide (Fab_PrLith_PK00_PG.pdf 1.2 MB)
    • Word Docs
      • Activity - Terminology Participant Guide (Fab_PrLith_AC00_PG_March2017.docx 169 KB)
      • Photoresist Thickness Activity Participant Guide (Fab_PrLith_AC10_PG_March2017.docx 307 KB)
      • Final Assessment Participant Guide (Fab_PrLith_FA00_PG_March2017.docx 337 KB)
      • Knowledge Probe Participant Guide ((Fab_PrLith_KP00_PG_March2017.docx 172 KB)
      • Primary Knowledge (PK) Participant Guide (Fab_PrLith_PK00_PG_March2017.docx 1.7 MB)
  • Presentations
    • Photolithography Overview for Microsystems (Presentation Photolithography.pdf 4.8 MB)
    • Photolithography Overview for Microsystems (Presentation Photolithography.pptx 3.6 MB)
Archived with ATE Central
Alternate Title Photolithography Overview for Microelectromechanical Systems Learning Module
Url http://scme-support.org/index.php/educational-materials/category-02/ph...
Associated File
Sample File
Publisher
Series
ATE Area
GEM Subject
Subject
Date Issued 2010
Resource Type
Format
Audience
Education Level
Language
Rights SCME
Access Rights
ATE Contributor
Record Type

Resource Comments

(no comments available yet for this resource)