Wet vs. Dry Oxidation Processes

In this video, created by Support Center for Microsystems Education (SCME), viewers can watch an animation on the difference between wet and dry thermal oxidation processes. This animation "shows a side by side comparison of a wet oxidation process vs. a dry oxidation process. Both processes use an oxygen source to grow silicon dioxide (SiO2) on a silicon wafer heated furnace. Wet thermal oxidation uses water vapor. Dry thermal oxidation uses oxygen gas." Viewers can learn more on this topic in the Deposition Overview for MEMS Learning Module which can be found on the SCME website along with supplementary materials.