Silicon Run Implantation

Produced as part of the Advanced Technological Education (ATE) program, Silicon Run Implantation takes a close look at the process of ion implantation. This video shows how ions are accelerated to high energies and directed into specific regions of the silicon substrate to change its molecular structure and alter its electrical properties. This 31-minute video also explores the various types of ion implanters used in IC fabrication. It also shows the role of energy, electrical potentials, beam analysis, ion acceleration, wafer scanning, and tilting in different ion implanters. A clip of the video is shown here, and the full video can be ordered from the site.